CNx films deposited using combined deposition method: pulsed laser deposition in the RF discharged nitrogen gas

J. Bulir; Miroslav Jelinek; Jan Lancok; M. Trchova; K. Jurek

doi:10.1117/12.432850

29 June 2001 CN_x films deposited using combined deposition method: pulsed laser deposition in the RF discharged nitrogen gas

J. Bulir, Miroslav Jelinek, Jan Lancok, M. Trchova, K. Jurek

Author Affiliations +

Proceedings Volume 4430, ROMOPTO 2000: Sixth Conference on Optics; (2001) https://doi.org/10.1117/12.432850
Event: ROMOPTO 2000: Sixth Conference on Optics, 2000, Bucharest, Romania

Abstract

Thin CN_x films were deposited by pulsed laser deposition (KrF excimer laser) with additional radio-frequency discharge of the nitrogen gas. Nitrogen pressure was in the range from 1 to 40 Pa and r.f. power was adjusted to 100 W. The substrate temperature was changed in the range from room temperature to 800 degree(s)C. An influence of the substrate temperature on the film composition and structure was studied. The composition of the films was measured by wavelength dispersive x-ray spectroscopy. The N/C ratio of films deposited at room temperature almost reach 1; however, it decreased with increasing substrate temperature. Structure was studied using Fourier transformed infrared spectroscopy analysis. Presence of CequalsC, CequalsN, CequalsVN, N-H and O-H groups was confirmed. Optical properties were analyzed using UV-VIS reflection spectroscopy.

Citation Download Citation

J. Bulir, Miroslav Jelinek, Jan Lancok, M. Trchova, and K. Jurek "CN_x films deposited using combined deposition method: pulsed laser deposition in the RF discharged nitrogen gas", Proc. SPIE 4430, ROMOPTO 2000: Sixth Conference on Optics, (29 June 2001); https://doi.org/10.1117/12.432850

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