Laser damage resistance of thin films for ultraviolet optical components

Angela M. Piegari; Maria Rita Perrone; Maria Lucia Protopapa

doi:10.1117/12.432820

29 June 2001 Laser damage resistance of thin films for ultraviolet optical components

Angela M. Piegari, Maria Rita Perrone, Maria Lucia Protopapa

Author Affiliations +

Proceedings Volume 4430, ROMOPTO 2000: Sixth Conference on Optics; (2001) https://doi.org/10.1117/12.432820
Event: ROMOPTO 2000: Sixth Conference on Optics, 2000, Bucharest, Romania

Abstract

The laser induced damage in optical coatings plays a limiting role in the laser reliability. Either the laser cavity mirrors and the optical components employed outside the cavity are often damaged by the laser radiation, delivered by high power lasers. Their resistance becomes more critical at shorter wavelengths, therefore the research is focused on the ultraviolet region where excimer lasers are finding many applications. Laser damage studies were performed at 248 nm (KrF laser) and 308 nm (XeCl laser) on MgF₂, HfO₂ and SiO₂ films and multilayer coatings. Results about the dependence of the damage threshold on both the deposition technique and standing-wave electric field profile inside the coating, are reported.

Citation Download Citation

Angela M. Piegari, Maria Rita Perrone, and Maria Lucia Protopapa "Laser damage resistance of thin films for ultraviolet optical components", Proc. SPIE 4430, ROMOPTO 2000: Sixth Conference on Optics, (29 June 2001); https://doi.org/10.1117/12.432820

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