Simplified model for RMS variation in pulsed laser deposition

Aurelian Marcu; Constantin Grigoriu; Kiyoshi Yatsui

doi:10.1117/12.432847

29 June 2001 Simplified model for RMS variation in pulsed laser deposition

Aurelian Marcu, Constantin Grigoriu, Kiyoshi Yatsui

Proceedings Volume 4430, ROMOPTO 2000: Sixth Conference on Optics; (2001) https://doi.org/10.1117/12.432847
Event: ROMOPTO 2000: Sixth Conference on Optics, 2000, Bucharest, Romania

Abstract

In Pulsed Laser Deposition (PLD) surface roughness of a deposited film is an important parameter for many thin films applications. Plume free expansion and propagation in a plane shadow mask experimental setup have been investigated together with film roughness for several deposition parameters. In this paper we propose a simplified formula for a RMS variation. A comparison between theoretical and experimental results is presented. The model is considered to be useful for quick roughness (RMS) estimation in PLD deposition.

Citation Download Citation

Aurelian Marcu, Constantin Grigoriu, and Kiyoshi Yatsui "Simplified model for RMS variation in pulsed laser deposition", Proc. SPIE 4430, ROMOPTO 2000: Sixth Conference on Optics, (29 June 2001); https://doi.org/10.1117/12.432847

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available