Simplified model for RMS variation in pulsed laser deposition

Aurelian Marcu; Constantin Grigoriu; Kiyoshi Yatsui

doi:10.1117/12.432847

29 June 2001 Simplified model for RMS variation in pulsed laser deposition

Aurelian Marcu, Constantin Grigoriu, Kiyoshi Yatsui

Author Affiliations +

Proceedings Volume 4430, ROMOPTO 2000: Sixth Conference on Optics; (2001) https://doi.org/10.1117/12.432847
Event: ROMOPTO 2000: Sixth Conference on Optics, 2000, Bucharest, Romania

Abstract

In Pulsed Laser Deposition (PLD) surface roughness of a deposited film is an important parameter for many thin films applications. Plume free expansion and propagation in a plane shadow mask experimental setup have been investigated together with film roughness for several deposition parameters. In this paper we propose a simplified formula for a RMS variation. A comparison between theoretical and experimental results is presented. The model is considered to be useful for quick roughness (RMS) estimation in PLD deposition.

Citation Download Citation

Aurelian Marcu, Aurelian Marcu, Constantin Grigoriu, Constantin Grigoriu, Kiyoshi Yatsui, Kiyoshi Yatsui, } "Simplified model for RMS variation in pulsed laser deposition", Proc. SPIE 4430, ROMOPTO 2000: Sixth Conference on Optics, (29 June 2001); doi: 10.1117/12.432847; https://doi.org/10.1117/12.432847

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