Simplified model for RMS variation in pulsed laser deposition

Aurelian Marcu; Constantin Grigoriu; Kiyoshi Yatsui

doi:10.1117/12.432847

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29 June 2001 Simplified model for RMS variation in pulsed laser deposition

Aurelian Marcu, Constantin Grigoriu, Kiyoshi Yatsui

Proceedings Volume 4430, ROMOPTO 2000: Sixth Conference on Optics; (2001) https://doi.org/10.1117/12.432847
Event: ROMOPTO 2000: Sixth Conference on Optics, 2000, Bucharest, Romania

Abstract

In Pulsed Laser Deposition (PLD) surface roughness of a deposited film is an important parameter for many thin films applications. Plume free expansion and propagation in a plane shadow mask experimental setup have been investigated together with film roughness for several deposition parameters. In this paper we propose a simplified formula for a RMS variation. A comparison between theoretical and experimental results is presented. The model is considered to be useful for quick roughness (RMS) estimation in PLD deposition.

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Aurelian Marcu, Constantin Grigoriu, and Kiyoshi Yatsui "Simplified model for RMS variation in pulsed laser deposition", Proc. SPIE 4430, ROMOPTO 2000: Sixth Conference on Optics, (29 June 2001); https://doi.org/10.1117/12.432847

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