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26 December 2001 Imaging ellipsometry for high-spatial-resolution metrology
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Abstract
The polarization change that accompanies diffraction from sub- wavelength features is used as a sensitive measure of the feature shape. This sub-wavelength measurement capability is explored by comparing vector-based diffraction models with experimentally obtained data from a novel imaging ellipsometer. This imaging ellipsometer is able to measure samples with high spatial resolution in a parallel fashion by using a high-numerical-aperture lens. Two-dimensional surface maps can be generated without scanning. Our novel metrology tool could provide a solution to the imminent metrology challenges in semiconductor industry.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Qiwen Zhan and James R. Leger "Imaging ellipsometry for high-spatial-resolution metrology", Proc. SPIE 4435, Wave Optics and VLSI Photonic Devices for Information Processing, (26 December 2001); https://doi.org/10.1117/12.451132
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