26 December 2001 Integration of grating couplers and optical PBG elements in standard S.O.I guiding wafers using one lithography level process
Author Affiliations +
Abstract
Integration of photonic crystals on standard SOI wafers used in microelectronics seems very attractive due to the large demand for optical and opto-electronic components in telecommunications. The 200nm thick silicon superficial layer which can be an interesting monomode waveguide for the wavelengths of interest presents important draw-backs and characterization of elementary blocks is not easy as reliable coupling of light in such thin films is still a challenge. We propose here a demonstrator made of an elementary photonic crystal and its associated grating couplers introduced for characterization purposes carried out in single step lithography process. Dimensions have been defined in order to realize an omnidirectional mirror in the 1.3-1.5micrometers range.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Nicole A. Paraire, Pascal G. Filloux, "Integration of grating couplers and optical PBG elements in standard S.O.I guiding wafers using one lithography level process", Proc. SPIE 4438, Physics, Theory, and Applications of Periodic Structures in Optics, (26 December 2001); doi: 10.1117/12.451489; https://doi.org/10.1117/12.451489
PROCEEDINGS
7 PAGES


SHARE
RELATED CONTENT

Towards autonomous testing of photonic integrated circuits
Proceedings of SPIE (February 20 2017)
Grating couplers using silicon-on-insulator
Proceedings of SPIE (March 26 1999)
Large-scale planar lightwave circuits
Proceedings of SPIE (January 27 2011)

Back to Top