9 November 2001 Farbrication of diffractive optical elements on a Si chip by an imprint lithography using nonsymmetrical silicon mold
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Abstract
Fabrication of a fine diffractive optical element on a Si chip is demonstrated using imprint lithography. A chirped diffraction grating, which has modulated pitched pattern with curved cross section is fabricated by an electron beam lithography, where the exposure dose profile is automatically optimized by computer aided system. Using the resist pattern as an etching mask, anisotropic dry etching is performed to transfer the resist pattern profile to the Si chip. The etched Si substrate is used as a mold in the imprint lithography. The Si mold is pressed to a thin polymer (poly methyl methacrylate) on a Si chip. After releasing the mold, a fine diffractive optical pattern is successfully transferred to the thin polymer. This method is exceedingly useful for fabrication of integrated diffractive optical elements with electric circuits on a Si chip.
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Yoshihiko Hirai, Yoshihiko Hirai, Masato Okano, Masato Okano, Takayuki Okuno, Takayuki Okuno, Hiroshi Toyota, Hiroshi Toyota, Tsutomu Yotsuya, Tsutomu Yotsuya, Hisao Kikuta, Hisao Kikuta, Yoshio Tanaka, Yoshio Tanaka, } "Farbrication of diffractive optical elements on a Si chip by an imprint lithography using nonsymmetrical silicon mold", Proc. SPIE 4440, Lithographic and Micromachining Techniques for Optical Component Fabrication, (9 November 2001); doi: 10.1117/12.448045; https://doi.org/10.1117/12.448045
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