9 November 2001 Minimizing Fizeau fringes during the contact printing of diffraction gratings
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Abstract
An index matching fluid has been used to minimize the effect of interference fringes which develop when contact printing diffraction gratings on silicon wafers. These fringes are the result of interference effects when there is a small but uneven gap between the photomask and resist surface. They are especially troublesome when printing and etching large area, coarse diffraction gratings on the surface of silicon wafers and silicon disks.
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Dino R. Ciarlo, Michael C. Rushford, Paul J. Kuzmenko, Jian Ge, "Minimizing Fizeau fringes during the contact printing of diffraction gratings", Proc. SPIE 4440, Lithographic and Micromachining Techniques for Optical Component Fabrication, (9 November 2001); doi: 10.1117/12.448041; https://doi.org/10.1117/12.448041
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KEYWORDS
Photomasks

Silicon

Printing

Diffraction gratings

Photoresist materials

Semiconducting wafers

Lithography

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