Translator Disclaimer
Paper
23 October 2001 Mueller matrix measurements of small spherical particles deposited on c-Si wafer
Author Affiliations +
Abstract
Mueller matrix ellipsometry measurements are performed on accurately sizes polystyrene latex (PSL) and silicon oxide (SiO2) spherical particles deposited on a crystalline silicon surface. The mean particle diameter ranges from 0.2 μm to 1.5 μm. An argon laser beam (wavelength 515 nm) is impinging on the sample at a fixed near grazing incidence angle. The Mueller matrix of the diffuse light scattered by the particles is measured in the plane of incidence as a function of the scattering angle. Results are presented and compared with exact theory.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Bernard Kaplan and Bernard Drevillon "Mueller matrix measurements of small spherical particles deposited on c-Si wafer", Proc. SPIE 4447, Surface Scattering and Diffraction for Advanced Metrology, (23 October 2001); https://doi.org/10.1117/12.446731
PROCEEDINGS
7 PAGES


SHARE
Advertisement
Advertisement
Back to Top