Recent developments in spectroscopic ellipsometry for in-situ applications

Blaine D. Johs; Jeff Hale; Natale Joseph Ianno; Craig M. Herzinger; Thomas E. Tiwald; John A. Woollam

doi:10.1117/12.450108

10 December 2001 Recent developments in spectroscopic ellipsometry for in-situ applications

Blaine D. Johs, Jeff Hale, Natale Joseph Ianno, Craig M. Herzinger, Thomas E. Tiwald, John A. Woollam

Proceedings Volume 4449, Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries II; (2001) https://doi.org/10.1117/12.450108
Event: International Symposium on Optical Science and Technology, 2001, San Diego, CA, United States

Abstract

The in situ measurement capabilities and advantages of recently developed spectroscopic ellipsometry (SE) instrumentation, which covers wide spectral ranges (190-1700 nm, or 0.73-6.5 eV) and is based on rotating-compensator technology, are described. A technique which can quantitatively correct for window birefringence is presented. Current in situ SE deposition monitoring and control applications in the compound semiconductor, display, and optical coatings industries are also presented.

Citation Download Citation

Blaine D. Johs, Jeff Hale, Natale Joseph Ianno, Craig M. Herzinger, Thomas E. Tiwald, and John A. Woollam "Recent developments in spectroscopic ellipsometry for in-situ applications", Proc. SPIE 4449, Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries II, (10 December 2001); https://doi.org/10.1117/12.450108

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