10 December 2001 Recent developments in spectroscopic ellipsometry for in-situ applications
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Abstract
The in situ measurement capabilities and advantages of recently developed spectroscopic ellipsometry (SE) instrumentation, which covers wide spectral ranges (190-1700 nm, or 0.73-6.5 eV) and is based on rotating-compensator technology, are described. A technique which can quantitatively correct for window birefringence is presented. Current in situ SE deposition monitoring and control applications in the compound semiconductor, display, and optical coatings industries are also presented.
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Blaine D. Johs, Blaine D. Johs, Jeff Hale, Jeff Hale, Natale Joseph Ianno, Natale Joseph Ianno, Craig M. Herzinger, Craig M. Herzinger, Thomas E. Tiwald, Thomas E. Tiwald, John A. Woollam, John A. Woollam, } "Recent developments in spectroscopic ellipsometry for in-situ applications", Proc. SPIE 4449, Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries II, (10 December 2001); doi: 10.1117/12.450108; https://doi.org/10.1117/12.450108
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