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10 December 2001 Recent developments in spectroscopic ellipsometry for in-situ applications
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The in situ measurement capabilities and advantages of recently developed spectroscopic ellipsometry (SE) instrumentation, which covers wide spectral ranges (190-1700 nm, or 0.73-6.5 eV) and is based on rotating-compensator technology, are described. A technique which can quantitatively correct for window birefringence is presented. Current in situ SE deposition monitoring and control applications in the compound semiconductor, display, and optical coatings industries are also presented.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Blaine D. Johs, Jeff Hale, Natale Joseph Ianno, Craig M. Herzinger, Thomas E. Tiwald, and John A. Woollam "Recent developments in spectroscopic ellipsometry for in-situ applications", Proc. SPIE 4449, Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries II, (10 December 2001);

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