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10 December 2001 X-ray study of surfaces and interfaces
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The analysis of the roughness of B4C films of different thickness as well as W/B4C multilayer mirrors of different periods is performed basing on AFM and x-ray scattering (XRS) measurements. It is demonstrated that the linear model of a film growth is able to describe the whole set of experimental data including films at initial island stage of growth, if suppose the relaxation processes of a film surface to depend on the film thickness. New approach to the inverse problem of x-ray reflectometry consisting in inferring the dielectric constant profile from the reflectivity data is shortly discussed.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Victor E. Asadchikov, Inna N. Bukreeva, Angela Duparre, Igor V. Kozhevnikov, Yury S. Krivonosov, Christian Morawe, Mikhail V. Pyatakhin, Joerg Steinert, Alexander V. Vinogradov, and Eric Ziegler "X-ray study of surfaces and interfaces", Proc. SPIE 4449, Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries II, (10 December 2001);


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