Nanometer accurate shaping with fluid jet polishing

Silvia M. Booij; Hedser H. van Brug; Mandeep Singh; Joseph J. M. Braat

doi:10.1117/12.453620

27 December 2001 Nanometer accurate shaping with fluid jet polishing

Silvia M. Booij, Hedser H. van Brug, Mandeep Singh, Joseph J. M. Braat

Author Affiliations +

Proceedings Volume 4451, Optical Manufacturing and Testing IV; (2001) https://doi.org/10.1117/12.453620
Event: International Symposium on Optical Science and Technology, 2001, San Diego, CA, United States

Abstract

This article describes the Fluid Jet Polishing process. An overview of the theoretical dependence of various important parameters is given. We discuss some results obtained with FJP, including typical material removal rates and roughness values. Some recent experiments are described that show that it is also possible to obtain removal rates as small as one nanometer per minute for glass surfaces. Specific surface profiles are created, both with and without the use of surface protecting masks.

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Silvia M. Booij, Hedser H. van Brug, Mandeep Singh, and Joseph J. M. Braat "Nanometer accurate shaping with fluid jet polishing", Proc. SPIE 4451, Optical Manufacturing and Testing IV, (27 December 2001); https://doi.org/10.1117/12.453620

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