13 December 2001 Recent progress in hybrid glass materials for micro-optical component fabrication
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Abstract
Hybrid glass materials are used in the photolithographic fabrication of optical and opto-mechanical structures. Two different methods are introduced. The first one is referred as photolithographic patterning and the other as direct photolithographic deforming of hybrid glass materials. Fabrication of isolated lenslets, lens arrays, gratings and other binary structures is presented. The hybrid glass material used in the photolithographic patterning features a maximum spectral extinction coefficient of 2.0 X 10-4 micrometers -1 between 450 nm and 1,600 nm and a refractive index of 1.53 at 632.8 nm. The fabricated structures feature large convex lens sags (up to 100 microns) with rms surface roughness values ranging from 10 to 45 nm, when the photolithographic patterning is applied. The hybrid glass material used in the direct photolithographic deforming exhibits a maximum spectral extinction coefficient of 1.6 X 10-3 micrometers -1 at wavelengths ranging from 450 nm to 2200 nm and a refractive index of 1.52 at 632.8 nm. The fabricated structures exhibit rms surface roughness between 1 and 5 nm, when direct photolithographic deforming is applied. These materials and methods are highly promising for micro- optics fabrication.
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Ari H. O. Karkkainen, Jeremy D. Rogers, Ghassan E. Jabbour, Juha T. Rantala, Michael R. Descour, "Recent progress in hybrid glass materials for micro-optical component fabrication", Proc. SPIE 4455, Micro- and Nano-optics for Optical Interconnection and Information Processing, (13 December 2001); doi: 10.1117/12.450449; http://dx.doi.org/10.1117/12.450449
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KEYWORDS
Glasses

Photomasks

Optical lithography

Binary data

Surface roughness

Absorbance

Refractive index

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