Optical absorption in amorphous LixWOy films: influence of sputtering conditions

Lars Berggren; Gunnar A. Niklasson

doi:10.1117/12.448248

13 November 2001 Optical absorption in amorphous Li_xWO_y films: influence of sputtering conditions

Lars Berggren, Gunnar A. Niklasson

Proceedings Volume 4458, Solar and Switching Materials; (2001) https://doi.org/10.1117/12.448248
Event: International Symposium on Optical Science and Technology, 2001, San Diego, CA, United States

Abstract

Sputtered thin films of amorphous tungsten oxide were deposited onto glass substrates coated by conductive indium- tin oxide. The films were sputtered in Ar/O₂ with different oxygen contents. Elastic Recoil Detection Analysis determined the density and the stoichiometry while x-ray diffraction gave evidence of the amorphous character. The films were electrochemically intercalated with lithium ions. At several intercalation levels the optical reflectance and transmittance was measured in the wavelength range 0.3 micrometers to 2.5 micrometers . We study the effect of different sputtering conditions on the coloration efficiency of the films. Films deposited at pressures of 80 mTorr showed a distinctly different absorption spectrum after intercalation, as compared to films sputtered at lower pressure. Sputtered substoichiometric tungsten oxide exhibits an absorption peak similar to the case of lithium intercalation. Substoichiometric films can be made transparent by deintercalation.

Citation Download Citation

Lars Berggren and Gunnar A. Niklasson "Optical absorption in amorphous Li_xWO_y films: influence of sputtering conditions", Proc. SPIE 4458, Solar and Switching Materials, (13 November 2001); https://doi.org/10.1117/12.448248

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