13 November 2001 Properties of electrochromic nickel-vanadium oxide films sputter-deposited from nonmagnetic alloy target
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Abstract
In this study we investigate the structure, composition, diffusion coefficient, and electrochromic properties of nickel-vanadium oxide films as a function of deposition conditions. Polycrystalline films have been deposited by DC magnetron sputtering from a nonmagnetic target of Ni0.93V0.07 in an atmosphere of O2/Ar and Ar/O2/H2, with the gas flow ratios varied systematically to cover the range from nearly-metallic to overoxidized films. The results contradict the usual view that films deposited in O2/Ar are dark brown in their as-deposited state. While such films can easily be deposited, the optimum electrochromic properties have been observed at O2/Ar ratios giving nearly transparent films. Addition of hydrogen to the sputtering atmosphere improved cycling stability of the films. The diffusion coefficient has been determined by the Galvanostatic Intermittent Titration Technique (GITT).
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Esteban Avendano, Andris Azens, Gunnar A. Niklasson, "Properties of electrochromic nickel-vanadium oxide films sputter-deposited from nonmagnetic alloy target", Proc. SPIE 4458, Solar and Switching Materials, (13 November 2001); doi: 10.1117/12.448243; https://doi.org/10.1117/12.448243
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