Sexafs Studies Of Nickel Silicide Nucleation On Si(111)

F Comin; J. E Rowe; P. H. Citrin

doi:10.1117/12.939187

27 March 1984 Sexafs Studies Of Nickel Silicide Nucleation On Si(111)

F Comin, J. E Rowe, P. H. Citrin

Proceedings Volume 0447, Science with Soft X-Rays; (1984) https://doi.org/10.1117/12.939187
Event: 1983 Brookhaven Conference: Science with Soft X-Rays, 1983, Upton, United States

Abstract

The direct structure determination of the silicide formed from < 1 monolayer of Ni deposited on room temperature Si(111) leads to a model for silicide growth and interface formation. The model forms a basis for understanding many of the photoemission, ion scattering, and microscopy results in this coverage regime.

Citation Download Citation

F Comin, J. E Rowe, and P. H. Citrin "Sexafs Studies Of Nickel Silicide Nucleation On Si(111)", Proc. SPIE 0447, Science with Soft X-Rays, (27 March 1984); https://doi.org/10.1117/12.939187

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