14 November 2001 Development of plasma chemical vaporization machining and elastic emission machining systems for coherent x-ray optics
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Abstract
Plasma CVM (chemical vaporization machining) and EEM (elastic emission machining) systems were developed for coherent X-ray optics fabrication. Figure-correction performances were tested in the spatial wavelength range from submillimeter to several hundreds mm, and those processes were certified to be promising technique to fabricate next-generation mirrors for coherent X-ray beams. A wave-optics simulation code was also developed to feed scientific analysis back to the fabrication technology. A figure measurement technique was also proposed to satisfy the suggestions from the wave-optics simulations. Simulated results indicated the necessity of the figure measurement with subnanometer accuracy having lateral resolution more than submillimeter.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yuzo Mori, Yuzo Mori, Y. Yamauchi, Y. Yamauchi, Kazuya Yamamura, Kazuya Yamamura, Hidekazu Mimura, Hidekazu Mimura, A. Saito, A. Saito, H. Kishimoto, H. Kishimoto, Y. Sekito, Y. Sekito, Masahiko Kanaoka, Masahiko Kanaoka, Alexei Souvorov, Alexei Souvorov, Makina Yabashi, Makina Yabashi, Kenji Tamasaku, Kenji Tamasaku, Tetsuya Ishikawa, Tetsuya Ishikawa, } "Development of plasma chemical vaporization machining and elastic emission machining systems for coherent x-ray optics", Proc. SPIE 4501, X-Ray Mirrors, Crystals, and Multilayers, (14 November 2001); doi: 10.1117/12.448496; https://doi.org/10.1117/12.448496
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