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14 November 2001 Planar parabolic lenses for focusing high-energy x-rays
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Abstract
Microelectronics technology involving photolithography and highly anisotropic plasma etching techniques was applied to fabricate planar parabolic refractive lenses. A set of Si planar parabolic lenses with apertures from 0.5 to 1.8 mm and 200 microns deep has been fabricated especially for high energy X-rays (E > 50 keV). Focusing properties in terms of the spot size and the efficiency in the energy range from 50 to 100 keV have been studied at the ESRF ID15 beamline. Linear focusing by single lens and by two-lens system as well as two-dimensional focusing by two lenses in cross geometry has been realized. Features of refractive collimator based on a set of planar lenses have been investigated and a technique for evaluation of the beam divergence in a micro radian range has been proposed. Future applications of proposed planar lenses are discussed.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Michail Grigoriev, Leonid Shabelnikov, Vecheslav Yunkin, Anatoly A. Snigirev, Irina Snigireva, Marco Di Michiel, Serguei Kuznetsov, Martin Hoffmann, and Edgar I. Voges "Planar parabolic lenses for focusing high-energy x-rays", Proc. SPIE 4501, X-Ray Mirrors, Crystals, and Multilayers, (14 November 2001); https://doi.org/10.1117/12.448494
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