6 December 2001 Compact high-power laser-plasma x-ray source for lithography
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Abstract
A compact laser produced plasma x-ray source radiates 24 Watts average power of 1nm x-rays in 2(pi) steradians. The x-ray power conversion efficiency is 9% from the laser average power focused on the x-ray target. The laser-plasma x-ray source is generated by a 300W compact, diode-pumped, solid-state Nd:YAG laser system. The tabletop laser system is constructed on a 4ft x 8ft optical bench and the laser modules are 1ft high. The total wall-plug power consumption for this laser-produced-plasma x-ray source is 22 kW. The x-ray source is optimized for integration with and x-ray stepper to provide a complete x-ray lithography exposure tool for the manufacture of high speed GaAs devices.
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Celestino J. Gaeta, Harry Rieger, I. C. Edmond Turcu, Richard Alan Forber, S. M. Campeau, Kelly L. Cassidy, Michael F. Powers, Robert K. Grygier, Juan R. Maldonado, G. French, Joe R. Naunguyan, Charles Kelsy, Peter Hark, James H. Morris, Richard M. Foster, "Compact high-power laser-plasma x-ray source for lithography", Proc. SPIE 4502, Advances in Laboratory-based X-Ray Sources and Optics II, (6 December 2001); doi: 10.1117/12.449863; https://doi.org/10.1117/12.449863
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