Absolute x-ray calibration of laser-produced plasmas using a CCD linear array and a focusing crystal spectrometer

Alexander P. Shevelko; Larry V. Knight; Quan Wang; Oleg F. Yakushev

doi:10.1117/12.448468

14 November 2001 Absolute x-ray calibration of laser-produced plasmas using a CCD linear array and a focusing crystal spectrometer

Alexander P. Shevelko, Larry V. Knight, Quan Wang, Oleg F. Yakushev

Author Affiliations +

Proceedings Volume 4504, Applications of X Rays Generated from Lasers and Other Bright Sources II; (2001) https://doi.org/10.1117/12.448468
Event: International Symposium on Optical Science and Technology, 2001, San Diego, CA, United States

Abstract

Absolute x-ray calibration of laser-produced plasmas was performed using a CCD linear array and a focusing crystal spectrometer. The plasmas were created by a Nd glass laser and a high repetition rate Nd-YAG laser. A commercial CCD was used for x-ray detection. The CCD linear array has 3724 pixels giving a total length of approximately 30 mm. First the CCD detector was absolutely calibrated using laser- produced plasmas and an FE⁵⁵ isotope source. The sensitivity of the detector was about two orders of magnitude higher than x-ray photographic film. The CCD detector was used for monitoring the absolute x-ray yield, for finding the optical focal position, for estimating the flux density on the target and for measuring the electron temperature of the plasma. In combination with a focusing von Hamos spectrometer the detector was used for absolute spectral measurements and determination of the plasma parameters. This spectrometer is promising for absolute spectral measurements of x-ray radiation of low-intensity sources and for numerous practical applications.

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Alexander P. Shevelko, Larry V. Knight, Quan Wang, and Oleg F. Yakushev "Absolute x-ray calibration of laser-produced plasmas using a CCD linear array and a focusing crystal spectrometer", Proc. SPIE 4504, Applications of X Rays Generated from Lasers and Other Bright Sources II, (14 November 2001); https://doi.org/10.1117/12.448468

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KEYWORDS

Charge-coupled devices

Plasmas

X-rays

Spectroscopy

Crystals

Calibration

Optical filters

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