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12 December 2001 X-ray laser progress for applications
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Abstract
We present a review of new progress performed in several laboratories (Laboratoire pour l'Utilisation des lasers Intenses, Rutherford Appleton Laboratory, Prague Asterix Laser System, Institute of Laser Engineering, Laboratoire d'Optique Appliquee). Concerning the realization of x-ray lasers sources, using different laser pumping techniques (600 ps, 100 ps, ns/ps, OFI) and the optimization of their optical properties, using curved and plane half-cavity mirrors. In parallel of these developments, we present the main results obtained with x-ray laser in interferometry applications. These studies concern on the one hand the Michelson interferometry with an x-ray laser emitting at 13.9 nm (recently realized at LULI), and on the other hand the Fresnel bi-mirror with an x-ray laser emitting at 21.2 nm (recently realized at PALS).
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
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