PROCEEDINGS VOLUME 4506
INTERNATIONAL SYMPOSIUM ON OPTICAL SCIENCE AND TECHNOLOGY | 29 JULY - 3 AUGUST 2001
Soft X-Ray and EUV Imaging Systems II
IN THIS VOLUME

6 Sessions, 20 Papers, 0 Presentations
EUVL  (4)
Metrology  (3)
Astronomy  (2)
Microscopy  (3)
Proceedings Volume 4506 is from: Logo
INTERNATIONAL SYMPOSIUM ON OPTICAL SCIENCE AND TECHNOLOGY
29 July - 3 August 2001
San Diego, CA, United States
EUVL
Proc. SPIE 4506, Liquid-xenon-jet laser-plasma source for EUV lithography, 0000 (20 December 2001); https://doi.org/10.1117/12.450943
Proc. SPIE 4506, Design and progress in the fabrication of an EUV micro exposure tool optics for PREUVE, 0000 (20 December 2001); https://doi.org/10.1117/12.450959
Proc. SPIE 4506, Effect of obstructions on the design of reflective ring-field projection systems, 0000 (20 December 2001); https://doi.org/10.1117/12.450960
Metrology
Proc. SPIE 4506, Upgrades to the NIST/DARPA EUV reflectometry facility, 0000 (20 December 2001); https://doi.org/10.1117/12.450961
Proc. SPIE 4506, Current status of ASET-HIT EUV phase-shifting point diffraction interferometer, 0000 (20 December 2001); https://doi.org/10.1117/12.450962
Proc. SPIE 4506, ComIXS: a compact inelastic x-ray spectrometer, 0000 (20 December 2001); https://doi.org/10.1117/12.450944
Multilayers I
Proc. SPIE 4506, Stress control of Mo/Si-based multilayer coatings deposited by ion-beam sputtering, 0000 (20 December 2001); https://doi.org/10.1117/12.450945
Proc. SPIE 4506, Improved reflectance and stability of Mo/Si multilayers, 0000 (20 December 2001); https://doi.org/10.1117/12.450946
Proc. SPIE 4506, First realization and characterization of multilayer EUV reflective coatings, 0000 (20 December 2001); https://doi.org/10.1117/12.450947
Proc. SPIE 4506, Enhanced soft x-ray reflectivity of Cr/Sc multilayers by ion-assisted sputter deposition, 0000 (20 December 2001); https://doi.org/10.1117/12.450948
Multilayers II
Proc. SPIE 4506, Prevention of MoSi multilayer reflection loss in EUVL tools, 0000 (20 December 2001); https://doi.org/10.1117/12.450949
Proc. SPIE 4506, Lifetime testing of EUV optics using intense synchrotron radiation at the PTB Radiometry Laboratory, 0000 (20 December 2001); https://doi.org/10.1117/12.450950
Proc. SPIE 4506, Bufferlayer and caplayer engineering of Mo/Si EUVL multilayer mirrors, 0000 (20 December 2001); https://doi.org/10.1117/12.450951
Astronomy
Proc. SPIE 4506, X-ray interferometry: ultra-high-resolution astronomy, 0000 (20 December 2001); https://doi.org/10.1117/12.450952
Proc. SPIE 4506, HERMES: an imaging x-ray fluorescence spectrometer for the BepiColombo mission to Mercury, 0000 (20 December 2001); https://doi.org/10.1117/12.450954
Microscopy
Proc. SPIE 4506, Scanning transmission soft x-ray microscopy at beamline X-1A at the NSLS: advances in instrumentation and selected applications, 0000 (20 December 2001); https://doi.org/10.1117/12.450955
Proc. SPIE 4506, Multipurpose experimental station for soft x-ray microscopy on BACH beamline at Elettra, 0000 (20 December 2001); https://doi.org/10.1117/12.450956
Proc. SPIE 4506, Differential interference contrast x-ray microscopy, 0000 (20 December 2001); https://doi.org/10.1117/12.450957
Multilayers II
Proc. SPIE 4506, Damage resistant and low-stress Si-based multilayer mirrors, 0000 (20 December 2001); https://doi.org/10.1117/12.450958
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