20 December 2001 First realization and characterization of multilayer EUV reflective coatings
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Experimental results on the realization of Mo/Si multilayer mirrors for EUV applications are presented. The multilayers have been deposited using RF-magnetron sputtering. The characterization of single layers and multilayers has been performed using different physical techniques. The reflectivity of multilayer mirrors optimised for 13 and 19 nm radiation has been measured and compared to simulation.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Piergiorgio Nicolosi, Alessandro Patelli, Maria-Guglielmina Pelizzo, Valentino Rigato, Gianluigi Maggioni, L. Depero, E. Bontempi, G. Mattei, Luca Poletto, Paolo Mazzoldi, Giuseppe Tondello, "First realization and characterization of multilayer EUV reflective coatings", Proc. SPIE 4506, Soft X-Ray and EUV Imaging Systems II, (20 December 2001); doi: 10.1117/12.450947; https://doi.org/10.1117/12.450947


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