20 December 2001 First realization and characterization of multilayer EUV reflective coatings
Author Affiliations +
Abstract
Experimental results on the realization of Mo/Si multilayer mirrors for EUV applications are presented. The multilayers have been deposited using RF-magnetron sputtering. The characterization of single layers and multilayers has been performed using different physical techniques. The reflectivity of multilayer mirrors optimised for 13 and 19 nm radiation has been measured and compared to simulation.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Piergiorgio Nicolosi, Piergiorgio Nicolosi, Alessandro Patelli, Alessandro Patelli, Maria-Guglielmina Pelizzo, Maria-Guglielmina Pelizzo, Valentino Rigato, Valentino Rigato, Gianluigi Maggioni, Gianluigi Maggioni, L. Depero, L. Depero, E. Bontempi, E. Bontempi, G. Mattei, G. Mattei, Luca Poletto, Luca Poletto, Paolo Mazzoldi, Paolo Mazzoldi, Giuseppe Tondello, Giuseppe Tondello, } "First realization and characterization of multilayer EUV reflective coatings", Proc. SPIE 4506, Soft X-Ray and EUV Imaging Systems II, (20 December 2001); doi: 10.1117/12.450947; https://doi.org/10.1117/12.450947
PROCEEDINGS
8 PAGES


SHARE
RELATED CONTENT

EUV/soft x-ray multilayer optics
Proceedings of SPIE (January 26 2005)
Study of ion beam sputtered Mo Si mirrors for EUV...
Proceedings of SPIE (February 24 2004)
Interfaces in Mo/Si multilayers
Proceedings of SPIE (January 31 1991)
Microstructure of Mo/Si multilayers with barrier layers
Proceedings of SPIE (December 23 2002)

Back to Top