20 December 2001 Lifetime testing of EUV optics using intense synchrotron radiation at the PTB Radiometry Laboratory
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Abstract
Degradation of EUV optics during irradiation is a crucial topic as regards lifetime and performance in EUV lithography. To simulate irradiation conditions for future lithography tools, PTB (the German national metrology institute) operates two dedicated beamlines at the electron storage ring BESSY II. Both, undispersed undulator radiation from an EUV optimized undulator as well as focused and filtered bending magnet radiation can be used. Both beamlines provide EUV radiation with power densities of several mW / mm2. A dedicated irradiation chamber with sample load lock and differential pumping allows components such as substrates, multilayer mirrors or filters to be exposed to EUV radiation under different vacuum conditions. At the same laboratory, high-accuracy EUV reflectometry can be performed for proximate assessment of the resulting performance.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Roman Klein, Alexander Gottwald, Frank Scholze, R. Thornagel, Johannes Tuemmler, Gerhard Ulm, Marco Wedowski, Frank Stietz, Bas Mertens, Norbert B. Koster, J. van Elp, "Lifetime testing of EUV optics using intense synchrotron radiation at the PTB Radiometry Laboratory", Proc. SPIE 4506, Soft X-Ray and EUV Imaging Systems II, (20 December 2001); doi: 10.1117/12.450950; https://doi.org/10.1117/12.450950
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