Sensitivity analyses for construction of monochrome electron guns

Roger Casanova Alig

doi:10.1117/12.451278

21 December 2001 Sensitivity analyses for construction of monochrome electron guns

Roger Casanova Alig

Proceedings Volume 4510, Charged Particle Detection, Diagnostics, and Imaging; (2001) https://doi.org/10.1117/12.451278
Event: International Symposium on Optical Science and Technology, 2001, San Diego, CA, United States

Abstract

Manufacturing irregularities and misalignments in electron guns for CRTs degrade the resolution, especially at high brightness. Using simulations of an electron gun that are 3D and include space charge, the spot size, which directly determines resolution, is calculated. These simulations are then used to calculate the sensitivies of spot size to misalignments, part-size tolerances, and lens out-of- roundness. Sensitivies for the manufacture of electron guns are defined and calculated. These sensitivities connect misalignments, part-size tolerances, and lens out-of- roundness to beam displacement in the lens, to beam size in the lens, and to focus astigmatism, respectively. With specifications for tolerances and misalignments, the distribution of spot sizes expected in manufacturing CRTs can be calculated. The importances of the specifications are prioritized in pareto charts. Logistics show which construction irregularity groups are benign and which ones threaten production crises. While monochrome electron guns are used to illustrate these concepts, they have been used for color electron guns and nanolithography, and they are applicable to many electron-optical systems.

Citation Download Citation

Roger Casanova Alig "Sensitivity analyses for construction of monochrome electron guns", Proc. SPIE 4510, Charged Particle Detection, Diagnostics, and Imaging, (21 December 2001); https://doi.org/10.1117/12.451278

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