Paper
10 August 2001 Comparison of ellipsometric methods for separate determination of thickness and optical constants of thin films
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Abstract
This talk is devoted to the analysis of different ellipsometric methods for their ability to get separately thickness and refractive index of thin films. Such analysis is necessary for unambiguous determination of all thin film parameters, not only its 'optical thickness.' Analysis and comparison of different approaches for solving of this problem is made both on the base of the theoretical consideration of methods background and on the calculation of correlation matrix for parameters of interest.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Eugene G. Bortchagovsky and O. M. Getsko "Comparison of ellipsometric methods for separate determination of thickness and optical constants of thin films", Proc. SPIE 4517, Lightmetry: Metrology, Spectroscopy, and Testing Techniques Using Light, (10 August 2001); https://doi.org/10.1117/12.435962
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Cited by 2 scholarly publications.
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KEYWORDS
Thin films

Refractive index

Silicon films

Dielectrics

Silicon

Ellipsometry

Absorption

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