Paper
29 May 2002 Microregion stress measurement of wafer
Shouyong Ni, Hongmin Shi, Lei Fu, Yaodong Lu
Author Affiliations +
Proceedings Volume 4537, Third International Conference on Experimental Mechanics; (2002) https://doi.org/10.1117/12.468854
Event: Third International Conference on Experimental Mechanics, 2002, Beijing, China
Abstract
A method based on birefringence principle of micro-region stress measurement is presented in this article. Frequency analysis of Fourier transform is used in data processing. This measurement system has the merits of high sensitivity and automatic data processing.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Shouyong Ni, Hongmin Shi, Lei Fu, and Yaodong Lu "Microregion stress measurement of wafer", Proc. SPIE 4537, Third International Conference on Experimental Mechanics, (29 May 2002); https://doi.org/10.1117/12.468854
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KEYWORDS
Semiconducting wafers

Data processing

Polarization

Modulation

Birefringence

Fourier transforms

Laser processing

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