28 September 2001 Fabrication of electromagnetic micromirror array
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Proceedings Volume 4557, Micromachining and Microfabrication Process Technology VII; (2001) https://doi.org/10.1117/12.442971
Event: Micromachining and Microfabrication, 2001, San Francisco, CA, United States
This paper describes the design, fabrication and experiments of a micromirror array driven by electromagnetic force for right angle beam reflection to the vertical direction of the substrate. The device was fabricated using aluminum surface micromachining combined with nickel electroplating. The micromirror has couple of torsional springs enough long for 45 degree rotation, which angular deflection is necessary for right angle beam reflection. Also micromirror has a magnetic material for electromagnetic operation, and it has a mechanical stopper for angular deflection control. The main structural material is evaporated aluminum, and magnetic material is electroplated nickel. Thick photoresist is used as a sacrificial layer, and it is removed by oxygen plasma process. Electromagnetic characteristics were measured to find that about 10kA/m magnetic field intensity is needed for 45 degrees angular deflection. 25V to approximately 50V clamping voltage is required for selectively operation between the array within the external magnetic field. The dynamic response measurement was fulfilled using He-Ne laser and position sensitive diode (PSD). The lapsed time to reach 45 degrees is less than 0.5ms. But upward spring bending prevents the stopper from touching the substrate, so some oscillations corresponding to natural response is observed.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
YunHo Jang, YunHo Jang, Yong-Kweon Kim, Yong-Kweon Kim, } "Fabrication of electromagnetic micromirror array", Proc. SPIE 4557, Micromachining and Microfabrication Process Technology VII, (28 September 2001); doi: 10.1117/12.442971; https://doi.org/10.1117/12.442971


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