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28 September 2001 Micromachining of ultrananocrystalline diamond
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Proceedings Volume 4557, Micromachining and Microfabrication Process Technology VII; (2001)
Event: Micromachining and Microfabrication, 2001, San Francisco, CA, United States
Ultrananocrystalline diamond (UNCD) with grain sizes in the range of 2 - 5 nm is produced using a microwave plasma chemical vapor deposition process with argon-rich C60 or CH4 plasmas. This material has excellent mechanical properties: high hardness and Young modulus, and an extremely low friction coefficient (approximately 0.01). It is resistant to chemical attack, and is potentially biocompatible. These properties make UNCD a very good candidate for a diamond-based microelectromechanical systems (MEMS) technology. We report on the micromachinability of this material by selective seeding, selective growth and reactive ion etching, in conjunction with SiO2 sacrificial layers for fabricating 3-D structures with freestanding or movable parts. These micromachining techniques are used to develop a totally UNCD-made turbine as a demonstration for UNCD-based MEMS.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Nicolai A. Moldovan, Orlando H. Auciello, Anirudha Sumant, John Carlisle, Ralu Divan, Dieter M. Gruen, Alan R. Krauss, Derrick C. Mancini, A. Jayatissa, and John Tucek "Micromachining of ultrananocrystalline diamond", Proc. SPIE 4557, Micromachining and Microfabrication Process Technology VII, (28 September 2001); doi: 10.1117/12.442958;

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