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28 September 2001 Patterning of diamond microstructures by bulk and surface micromachining for MEMS devices
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Proceedings Volume 4557, Micromachining and Microfabrication Process Technology VII; (2001) https://doi.org/10.1117/12.442941
Event: Micromachining and Microfabrication, 2001, San Francisco, CA, United States
Abstract
In this paper, diamond microstructures were patterned over silicon/silicon dioxide substrate using the processes combined with bulk or surface micromachining, selective growth of diamond and plasma etching technique. Polycrystalline diamond films were prepared using microwave plasma enhanced chemical vapor deposition (MW-PECVD) and a gas mixture of hydrogen and methane. Two types of techniques for precise patterning of diamond microstructures were investigated in this paper. The first one was to selectively grow diamond films in the desired region by pre-depositing a Pt interlayer on silicon dioxide layer. The second one was to selectively etch the deposited diamond film in oxygen/argon plasma under an Al mask. Different microstructures, for example, microgear, microrotor, comb drive structure, etc. were successfully fabricated.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yongqing Fu and Hejun Du "Patterning of diamond microstructures by bulk and surface micromachining for MEMS devices", Proc. SPIE 4557, Micromachining and Microfabrication Process Technology VII, (28 September 2001); https://doi.org/10.1117/12.442941
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