11 March 2002 Development of refined cleaning technique focusing on ecological viewpoint
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We are focusing on a high-performance cleaning process with minimum use of chemicals. For the substitution of chemicals, the refined cleaning tools and process have been developed, which use the high-concentration ozonic together with hydrogen water. To optimize a cleaning process, we have evaluated the removal and decomposition efficiency of organic compounds on the mask surface, the optical degradation of Cr and Suicide materials and so on. In conclusion, the substitution of sulfuric acid, ammonia and other chemicals is available for practical cleaning process by combining their functional cleaning steps. Especially in the ArF generation, this cleaning technique was found to be promising for the reduction of optical-damage and chemical residues for mask patterns and as well as high-efficiency particle removal.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Koji Tange, Koji Tange, Yoshikazu Nagamura, Yoshikazu Nagamura, Kunihiro Hosono, Kunihiro Hosono, Yuki Oomasa, Yuki Oomasa, Koichi Kido, Koichi Kido, Atsushi Hayashi, Atsushi Hayashi, Yasutaka Kikuchi, Yasutaka Kikuchi, Ichiro Imagawa, Ichiro Imagawa, Yuichi Matsuzawa, Yuichi Matsuzawa, Hozumi Usui, Hozumi Usui, } "Development of refined cleaning technique focusing on ecological viewpoint", Proc. SPIE 4562, 21st Annual BACUS Symposium on Photomask Technology, (11 March 2002); doi: 10.1117/12.458332; https://doi.org/10.1117/12.458332

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