11 March 2002 Improved yield with SMIF implementation on ALTA systems
Author Affiliations +
Abstract
The need for higher yields on high-value masks has heightened the mask making industry's sensitivity to mask defects. Decreasing the number of mask defects has necessitated improvements in the material handling throughout the production line, and in particular, from mask writer to mask etcher. Already one of the cleanest mask pattern generating systems in the world, implementing a SMIF material-handling paradigm on the ALTA systems decreased the number of defects attributable to the mask writer. ALTA 3000 through ALTA 3700 systems, configured with the SMIF Material Handling upgrade, allow the user to choose between the use of SEMI standard E100-0200 reticle SMIF pods or legacy magazines for loading and unloading reticles. When using SMIF material handling exclusively in production mask manufacture, the number of observed mask defects dropped measurably. The decreased number of defects on the masks improves turn around time, yield, and can decrease the cost of mask manufacturing. Observed defect data will be presented for an ALTA 3500 system before and after the SMIF upgrade.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jacob Doushy, Gregory E. Valentin, Paul Geller, "Improved yield with SMIF implementation on ALTA systems", Proc. SPIE 4562, 21st Annual BACUS Symposium on Photomask Technology, (11 March 2002); doi: 10.1117/12.458320; https://doi.org/10.1117/12.458320
PROCEEDINGS
8 PAGES


SHARE
RELATED CONTENT

1999 mask industry quality assessment
Proceedings of SPIE (December 30 1999)
1996 mask industry quality assessment
Proceedings of SPIE (December 27 1996)
History and future of mask making
Proceedings of SPIE (December 27 1996)
1997 mask industry quality assessment
Proceedings of SPIE (February 12 1997)
New look at incoming pellicle inspection
Proceedings of SPIE (January 01 1992)

Back to Top