11 March 2002 Photomask blank shelf-life study on e-beam chemically amplified resists
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Abstract
Fabrication of 130nm and below technology node photomasks favors EBeam chemically amplified resist (CAR) due to its higher sensitivity, contrast and resolution. However, chemically amplified resist is in general much more sensitive to the environment compared to conventional resists such as PBS and ZEP7000. Coated CAR blank shelf life will have a major impact on CD control of high-end photomask manufacturing especially for extended delay situations. This paper presents blank supplier packaging methods and rawstock storage conditions and their impact on CAR blank shelf life in the photomask fabrication facility. We selected one of the top chemically amplified e-beam resists for this study.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Feng Qian, Feng Qian, David Y. Chan, David Y. Chan, Masahiko Ishizuka, Masahiko Ishizuka, Akira Kurabayashi, Akira Kurabayashi, Takumi Ogawa, Takumi Ogawa, Ryoichi Kobayashi, Ryoichi Kobayashi, Takaei Sasaki, Takaei Sasaki, } "Photomask blank shelf-life study on e-beam chemically amplified resists", Proc. SPIE 4562, 21st Annual BACUS Symposium on Photomask Technology, (11 March 2002); doi: 10.1117/12.458337; https://doi.org/10.1117/12.458337
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