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11 March 2002 Stage tracking of a mask-scan EB mask writer test stand
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Abstract
A stage tracking function has been developed for a mask-scan EB mask writer. Position error of EB mask on an EB-mask-stage induces position error of projection beam on the EB-mask and the position of a writing pattern. The position of the EB-mask is measured by a laser interferometer. The shift from the aimed position is fed back to a mask selection deflection and a main deflection. The velocity of EB-mask stage and specimen-stage is also fed back to the deflection. The deflection control unit for the stage tracking has been made and the tracking function confirmed from the test memory of the unit. Using the unit, scanning writing patterns have been obtained with step and repeat stage mode.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Shinsuke Nishimura, Soichiro Mitsui, Munehiro Ogasawara, Kiminobu Akeno, Mitsuko Shimizu, Hideo Kusakabe, Hirotsugu Wada, Kiyoshi Hattori, Shusuke Yoshitake, Naoharu Shimomura, Jun Takamatsu, Hitoshi Sunaoshi, Yuuji Fukudome, Toru Tojo, and Seiichi Tsuchiya "Stage tracking of a mask-scan EB mask writer test stand", Proc. SPIE 4562, 21st Annual BACUS Symposium on Photomask Technology, (11 March 2002); https://doi.org/10.1117/12.458327
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