11 March 2002 Zep process optimization for submicron reticle fabrication in high-acceleration voltage writing tool
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Junsik S. Cho, Lee-Ju Kim, Cheol Shin, "Zep process optimization for submicron reticle fabrication in high-acceleration voltage writing tool", Proc. SPIE 4562, 21st Annual BACUS Symposium on Photomask Technology, (11 March 2002); doi: 10.1117/12.458349; https://doi.org/10.1117/12.458349
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