11 March 2002 Zep process optimization for submicron reticle fabrication in high-acceleration voltage writing tool
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Proceedings Volume 4562, 21st Annual BACUS Symposium on Photomask Technology; (2002); doi: 10.1117/12.458349
Event: Photomask 2001, 2001, Monterey, CA, United States
Abstract
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Junsik S. Cho, Lee-Ju Kim, Cheol Shin, "Zep process optimization for submicron reticle fabrication in high-acceleration voltage writing tool", Proc. SPIE 4562, 21st Annual BACUS Symposium on Photomask Technology, (11 March 2002); doi: 10.1117/12.458349; https://doi.org/10.1117/12.458349
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KEYWORDS
Dry etching

Reticles

Manufacturing

Scattering

Photomasks

Critical dimension metrology

Optical proximity correction

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