19 October 2001 Fabrication of planar optical waveguide material on silicon by flame hydrolysis deposition
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Proceedings Volume 4580, Optoelectronics, Materials, and Devices for Communications; (2001) https://doi.org/10.1117/12.444971
Event: Asia-Pacific Optical and Wireless Communications Conference and Exhibit, 2001, Beijing, China
SiO2 thick films were deposited on silicon wafer (2 inches in diameter) as buffer layer for fabricating planar optical wave-guide by flame hydrolysis deposition (FHD) method. The deposition speed is as high as 8μ+m per minute. Then the deposited films were consolidated in electric furnaces in vacuum or air ambience at the temperature of 1380°C. As a result, transparent vitreous silica (or called silica glass) and semi-transparent cristobalite films were obtained. The thickness of the vitreous silica films is up to 40μm, and this kind of films is suitable for buffer layer of planar wave-guide. SiO2 thick films doped with GeO2 were obtained by the same process to fabricate the core layer. Finally, several factors affecting the consolidated silica films were discussed in detail.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yuanda Wu, Yuanda Wu, Hua Xing, Hua Xing, Letian Zhang, Letian Zhang, Zhongchang Zhuo, Zhongchang Zhuo, Yongshen Yu, Yongshen Yu, Wei Zheng, Wei Zheng, Guofan Liu, Guofan Liu, Yushu Zhang, Yushu Zhang, } "Fabrication of planar optical waveguide material on silicon by flame hydrolysis deposition", Proc. SPIE 4580, Optoelectronics, Materials, and Devices for Communications, (19 October 2001); doi: 10.1117/12.444971; https://doi.org/10.1117/12.444971

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