21 November 2001 Experimental investigation of sensitivity dependence with respect to waveguide position on a micromachined diaphragm in a silicon-based integrated optic pressure sensor
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Abstract
We have been developing a silicon-based integrated optic pressure sensor using an intermodal interference between the fundamental TM-like and TE-like modes. The sensor has a micromachined diaphragm with a sensing waveguide as a pressure-sensitive structure. The sensor is theoretically known to have a strong dependence of sensitivity on the sensing waveguide on the diaphragm. According to the theoretical prediction for the sensor based on the elasto-optic effect, the waveguide should be placed along the diaphragm edge to maximize sensitivity. To date, such dependence has not been experimentally examined in detail. In this study, two sensors with 20 or more waveguides placed at 0.1mm intervals on the diaphragm were fabricated to determine the relationship between sensitivity and waveguide position. The diaphragm dimensions were (1) 2.0mmX10mmX35micrometers and (2) 3.0mmX15mmX64micrometers . The ratio between width and length of each diaphragm was 1:5. The maximum sensitivity of 100 mrad/kPa was obtained for the waveguide nearest to the diaphragm edge with a wavelength of 633nm. In addition, the measured sensitivities were very similar for the corresponding waveguide positions in the two sensors since a scaling factor, which is defined as the cube of the either side length divided by the square of the thickness, was set as a constant.
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Takeshi Goto, Takeshi Goto, Atsushi Yamada, Atsushi Yamada, Masashi Ohkawa, Masashi Ohkawa, Seishi Sekine, Seishi Sekine, Takashi Sato, Takashi Sato, } "Experimental investigation of sensitivity dependence with respect to waveguide position on a micromachined diaphragm in a silicon-based integrated optic pressure sensor", Proc. SPIE 4591, Electronics and Structures for MEMS II, (21 November 2001); doi: 10.1117/12.449164; https://doi.org/10.1117/12.449164
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