Fabrication of planar waveguides using PECVD/RIE

Rod W. Boswell

doi:10.1117/12.446560

29 October 2001 Fabrication of planar waveguides using PECVD/RIE

Rod W. Boswell

Proceedings Volume 4594, Design, Fabrication, and Characterization of Photonic Devices II; (2001) https://doi.org/10.1117/12.446560
Event: International Symposium on Photonics and Applications, 2001, Singapore, Singapore

Abstract

Existing optical fiber and fiber-device fabrication techniques have been complemented recently by the development of new processes for the fabrication of planar optical waveguides and devices. These processes rely on new forms of plasma reactors and diagnostic systems which allow in-situ control of optical parameters such as refractive index. Recent technical developments in the micro- electronics industry now allow the fabrication of very compact and highly complex optical circuitry which can be produced on a single photonic chip. They also offer the potential to integrate photonic devices with semiconductor sources and detectors to realize a compact, hybrid photonic- optoelectronic chip, complete with fiber pig-tailing. Because of their compactness and potential low cost, these types of photonic chips are attractive components for future high-capacity optical telecommunications and other networks now being planned. This paper presents the general techniques used in the plasma processing of thin films of silicate glasses including Plasma Enhanced Chemical Vapor Deposition and Reactive Ion Etching.

Citation Download Citation

Rod W. Boswell "Fabrication of planar waveguides using PECVD/RIE", Proc. SPIE 4594, Design, Fabrication, and Characterization of Photonic Devices II, (29 October 2001); https://doi.org/10.1117/12.446560

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