Fabrication of a micromold using negative PMER

Young Ah Kwon; Kyoung-Soo Chae; Dae Sok Jeoung; Jong Yong Kim; Sung Moon

doi:10.1117/12.444743

15 October 2001 Fabrication of a micromold using negative PMER

Young Ah Kwon, Kyoung-Soo Chae, Dae Sok Jeoung, Jong Yong Kim, Sung Moon

Proceedings Volume 4601, Micromachining and Microfabrication Process Technology and Devices; (2001) https://doi.org/10.1117/12.444743
Event: International Symposium on Optoelectonics and Microelectronics, 2001, Nanjing, China

Abstract

We fabricated a micro mold using UV-lithography process with a novel mold material, negative PMER. Negative PMER(TOK, PMER N-CA3000) is a chemically amplified negative tone photoresist on a novolak resin base. It can be processed using standard equipment such as standard spin coater, baking with ovens or hotplates, and immersion development tools. Good quality resist patterns of up to 36μm thickness were achieved by means of this equipment in a short time. The conditions of this process were pre-exposure bake of 110 degree(s)C/12min, exposure dose of 675mJ/cm² post-exposure bake of 100 degree(s)C/9min, and development for 10min.

Citation Download Citation

Young Ah Kwon, Kyoung-Soo Chae, Dae Sok Jeoung, Jong Yong Kim, and Sung Moon "Fabrication of a micromold using negative PMER", Proc. SPIE 4601, Micromachining and Microfabrication Process Technology and Devices, (15 October 2001); https://doi.org/10.1117/12.444743

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