15 October 2001 Measurement of heat capacity of SnO2 thin films using microhotplate
Author Affiliations +
Proceedings Volume 4601, Micromachining and Microfabrication Process Technology and Devices; (2001) https://doi.org/10.1117/12.444709
Event: International Symposium on Optoelectonics and Microelectronics, 2001, Nanjing, China
Abstract
Thermophysical properties of thin films in microscale are much more different from that of bulk materials. It is very important to characterize their properties for the design and analysis of MEMS devices and ICs. In this paper we demonstrate a technique to test heat capacity of SnO2 thin film. For this purpose, micro-hotplate (MHP) is used as a thin-film differential scanning calorimeter (TDSC). Micro-hotplate is a suspended structure that uses SiO2/Si3N4 membrane as mechanical support and polysilicon resistors as heater and temperature sensor. Providing a pulsed power to the heater, MHP will be heated up with heating rate of about 200000 degree(s)C/s, and with TDSC technique, heat capacity of SnO2 thin film with thickness of 300nm is measured at temperature ranging from room temperature to 400K.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jun Yu, Zhenan Tang, Guangfen Wei, Philip C.H. Chan, "Measurement of heat capacity of SnO2 thin films using microhotplate", Proc. SPIE 4601, Micromachining and Microfabrication Process Technology and Devices, (15 October 2001); doi: 10.1117/12.444709; https://doi.org/10.1117/12.444709
PROCEEDINGS
4 PAGES


SHARE
Back to Top