15 October 2001 Modeling and fabrication of micro 3K-2-type planetary gear reducer utilizing SU-8 photoresist as alternative LIGA technology
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Proceedings Volume 4601, Micromachining and Microfabrication Process Technology and Devices; (2001) https://doi.org/10.1117/12.444690
Event: International Symposium on Optoelectonics and Microelectronics, 2001, Nanjing, China
Abstract
The LIGA type process, utilizing SU-8 photoresist as alternative LIGA technology, can fabricate high aspect ratio microstructures without employing synchrotron light and suitable X-ray mask. Based on LIGA type process in this paper, detailed investigations of the modeling and fabrication of micro 3K-2 type planetary gear reducer, such as the modeling and design of micro reducer, CAD of micro gear mask, SU-8 UV photolithography, micro electroforming, micro molding, have been performed. And 400 um thickness sun gear, 400 um thickness planet gear, 200 um thickness fixed inner gear, and 200 um thickness rotary inner gear, whose teeth are 15,11,36,39 respectively, have been obtained. Utilizing these gears, the micro reducer whose modulus, outer diameter and velocity ratio are 0.03, 2mm, 44.2:1, has been assembled and applied in (phi) 2mm micro electro magnetic motor successfully.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Weiping Zhang, Weiping Zhang, Wenyuan Chen, Wenyuan Chen, Di Chen, Di Chen, Xiaomei Chen, Xiaomei Chen, Xiaosheng Wu, Xiaosheng Wu, Zhengfu Xu, Zhengfu Xu, } "Modeling and fabrication of micro 3K-2-type planetary gear reducer utilizing SU-8 photoresist as alternative LIGA technology", Proc. SPIE 4601, Micromachining and Microfabrication Process Technology and Devices, (15 October 2001); doi: 10.1117/12.444690; https://doi.org/10.1117/12.444690
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