Polymer and glass etching by ArF and XeCl excimer lasers

Qihong Lou; Lin Zhang

doi:10.1117/12.444685

15 October 2001 Polymer and glass etching by ArF and XeCl excimer lasers

Qihong Lou, Lin Zhang

Proceedings Volume 4601, Micromachining and Microfabrication Process Technology and Devices; (2001) https://doi.org/10.1117/12.444685
Event: International Symposium on Optoelectonics and Microelectronics, 2001, Nanjing, China

Abstract

In this paper, a fast process of fabrication of diffractive optical elements by excimer laser ablation of polymer films is mainly described. For fabrication of a two-level diffractive element, fewer steps and less time are needed.

Citation Download Citation

Qihong Lou and Lin Zhang "Polymer and glass etching by ArF and XeCl excimer lasers", Proc. SPIE 4601, Micromachining and Microfabrication Process Technology and Devices, (15 October 2001); https://doi.org/10.1117/12.444685

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