15 October 2001 Polymer and glass etching by ArF and XeCl excimer lasers
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Proceedings Volume 4601, Micromachining and Microfabrication Process Technology and Devices; (2001); doi: 10.1117/12.444685
Event: International Symposium on Optoelectonics and Microelectronics, 2001, Nanjing, China
Abstract
In this paper, a fast process of fabrication of diffractive optical elements by excimer laser ablation of polymer films is mainly described. For fabrication of a two-level diffractive element, fewer steps and less time are needed.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Qihong Lou, Lin Zhang, "Polymer and glass etching by ArF and XeCl excimer lasers", Proc. SPIE 4601, Micromachining and Microfabrication Process Technology and Devices, (15 October 2001); doi: 10.1117/12.444685; https://doi.org/10.1117/12.444685
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