16 October 2001 Exposure uniformity analysis and optimization for scanning mirror system in Hefei lithography beam line
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Proceedings Volume 4602, Semiconductor Optoelectronic Device Manufacturing and Applications; (2001) https://doi.org/10.1117/12.445737
Event: International Symposium on Optoelectonics and Microelectronics, 2001, Nanjing, China
Abstract
It is a new technology to use synchrotron radiation lithography for making large scale integral circuit. Synchrotron radiation lithography System is composed of lithography beam line and exposure chamber. A scanning mirror system is making the largest linear exposure area for integrate circuit. By means of increasing control fineness and optimizing scanning frequency in on-line control system, the uniformity of exposure grating is improved quite well. It is opening good idea for every scientist and technician to continue study. It is shown that inspect and control system is still reliable, noise reduced and very convenient after several years operation. It shows operating status of each equipment and vacuum figures on beam line and station, mirror scanning linearity, exposure time, beam current, and so on. Some successful soft X-ray lithography sub-micrometer results are achieved by different users in this system, they are showing very good resolution, more clear leakage and enough depth for example. A convenient and smart optimum analysis system will be developed soon. It is easy to find very good oscillation frequency for mirror vibrating, and the strong interference from current monitor in synchrotron radiation storage ring is reduced very well. Convenient, compact, reliability and safety are the basic but important idea of system design, and what is higher level consideration for getting fine result of micro lithography. There will have enough database space for a different kind user to storage on- line test datum in system.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Congliang Guo, Chuanshi Yin, Tonghui Liu, Aijuan Zhong, Shinan Qian, "Exposure uniformity analysis and optimization for scanning mirror system in Hefei lithography beam line", Proc. SPIE 4602, Semiconductor Optoelectronic Device Manufacturing and Applications, (16 October 2001); doi: 10.1117/12.445737; https://doi.org/10.1117/12.445737
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