16 October 2001 Study of improvement of imaging quality in project photolithography with amplitude phase compound filtering
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Proceedings Volume 4602, Semiconductor Optoelectronic Device Manufacturing and Applications; (2001) https://doi.org/10.1117/12.445749
Event: International Symposium on Optoelectonics and Microelectronics, 2001, Nanjing, China
Abstract
In accordance with the disadvantages of focus depth decrease caused by the large enough numerical aperture of the project photolithography imaging system and larger optical energy loss of amplitude filtering, the improvements in imaging resolution, focus depth and the availability of optical energy by means of amplitude phase compound filtering are studied in detail. The fact that corresponding optimal compound filters should be designed according to the different mask pattern designs has been proposed. The calculation analysis and experimental results show that amplitude phase compound filtering can improve the imaging resolution and focus depth of project photolithography by a big margin. At the same time the availability of optical energy can be improved and this is good for the improvement of production efficiency.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Xunan Chen, Xunan Chen, Xiqiao Kang, Xiqiao Kang, Xiangang Luo, Xiangang Luo, Jianping Shi, Jianping Shi, } "Study of improvement of imaging quality in project photolithography with amplitude phase compound filtering", Proc. SPIE 4602, Semiconductor Optoelectronic Device Manufacturing and Applications, (16 October 2001); doi: 10.1117/12.445749; https://doi.org/10.1117/12.445749
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