24 July 2002 Nanometer-scale metrology: meeting the nanotechnology measurement challenges
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Proceedings Volume 4608, Nanostructure Science, Metrology, and Technology; (2002); doi: 10.1117/12.437742
Event: Workshop on Nanostructure Science, Metrology, and Technology, 2001, Gaithersburg, MD, United States
Abstract
NIST is responsible to U.S. industry for developing length intensive measurement capabilities and calibration standards in the nanometer scale regime. The Nanometer-Scale Metrology Program is an integrated Manufacturing Engineering Laboratory program composed of projects all aimed at accurate nano-length metrology. These projects range (in part) from scanning probe microscopies, optical microscopy, interferometry, scanning electron microscopy, and include traditional linescale interferometry which maintains the NIST capability for length scale measurements at a World-class level. The industrial relevancy of the research and standards provided by this program has resulted in a large number of industrial interactions.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Michael T. Postek, "Nanometer-scale metrology: meeting the nanotechnology measurement challenges", Proc. SPIE 4608, Nanostructure Science, Metrology, and Technology, (24 July 2002); doi: 10.1117/12.437742; https://doi.org/10.1117/12.437742
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KEYWORDS
Standards development

Metrology

Scanning electron microscopy

Semiconductors

Calibration

Nanotechnology

Photomasks

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