Translator Disclaimer
24 July 2002 Scan linearity: a hidden factor in SEM magnification calibration
Author Affiliations +
Proceedings Volume 4608, Nanostructure Science, Metrology, and Technology; (2002) https://doi.org/10.1117/12.437972
Event: Workshop on Nanostructure Science, Metrology, and Technology, 2001, Gaithersburg, MD, United States
Abstract
Scan linearity of a review (cross-section) Scanning Electron Microscope (SEM) has been studied using Nanometrology’s proprietary software and reference samples. Nonlinearity across the field of view was measured at greater than 6.5% before and under 1% after correction by the SEM company’s engineer. The scan non-linearity was measured with precision better than 0.2% across the field of view. This is in spite of the nonuniformity of the reference sample which was measured at greater than 2.5%. The precision of the non-uniformity measurement of the reference sample was better than 0.1%.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Albert Sicignano, Arkady V. Nikitin, Dmitriy Y. Yeremin, Matthew Sandy, and E. Tim Goldburt "Scan linearity: a hidden factor in SEM magnification calibration", Proc. SPIE 4608, Nanostructure Science, Metrology, and Technology, (24 July 2002); https://doi.org/10.1117/12.437972
PROCEEDINGS
8 PAGES


SHARE
Advertisement
Advertisement
Back to Top